Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source

Yukio Fujiwara; Kouji Kondou; Hidehiko Nonaka; Naoaki Saito; Hiroshi Itoh; Toshiyuki Fujimoto; Akira Kurokawa; Shingo Ichimura; Mitsuhiro Tomita

doi:10.1143/JJAP.45.L987

Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source

Yukio Fujiwara^*, Kouji Kondou, Hidehiko Nonaka, Naoaki Saito, Hiroshi Itoh, Toshiyuki Fujimoto, Akira Kurokawa, Shingo Ichimura, Mitsuhiro Tomita

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Tetrairidium dodecacarbonyl, Ir₄(CO)₁₂, is a metal cluster complex that has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, secondary ion mass spectrometry (SIMS) of poly(methyl methacrylate) (PMMA) thin films on silicon substrates was performed with a quadrupole mass spectrometer. The secondary ion intensity of PMMA bombarded with Ir₄(CO)₇⁺ ions was investigated in the beam energy ranging from 3 to 10 keV at an incident angle of 45°. For comparison, bombardment with oxygen ions, O₂⁺, was also tested. It was confirmed that the use of Ir₄(CO)₇ ⁺ ions enhanced secondary ion intensity by at least one order of magnitude compared with that of O₂⁺ ions. Experimental results also showed that secondary ion intensity increased with beam energy; particularly, high-mass secondary ion intensity markedly increased.

Original language	English
Pages (from-to)	L987-L990
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	45
Issue number	33-36
DOIs	https://doi.org/10.1143/JJAP.45.L987
Publication status	Published - 2006 Sept 8
Externally published	Yes

Keywords

Ion beam
Lr(CO)
Metal cluster complex
Organic film
PMMA
Poly(methyl methacrylate)
Polymer
SIMS
Sputtering

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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@article{e30353751d0b47089e063601a21db6a3,

title = "Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source",

abstract = "Tetrairidium dodecacarbonyl, Ir4(CO)12, is a metal cluster complex that has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, secondary ion mass spectrometry (SIMS) of poly(methyl methacrylate) (PMMA) thin films on silicon substrates was performed with a quadrupole mass spectrometer. The secondary ion intensity of PMMA bombarded with Ir4(CO)7+ ions was investigated in the beam energy ranging from 3 to 10 keV at an incident angle of 45°. For comparison, bombardment with oxygen ions, O2+, was also tested. It was confirmed that the use of Ir4(CO)7 + ions enhanced secondary ion intensity by at least one order of magnitude compared with that of O2+ ions. Experimental results also showed that secondary ion intensity increased with beam energy; particularly, high-mass secondary ion intensity markedly increased.",

keywords = "Ion beam, Lr(CO), Metal cluster complex, Organic film, PMMA, Poly(methyl methacrylate), Polymer, SIMS, Sputtering",

author = "Yukio Fujiwara and Kouji Kondou and Hidehiko Nonaka and Naoaki Saito and Hiroshi Itoh and Toshiyuki Fujimoto and Akira Kurokawa and Shingo Ichimura and Mitsuhiro Tomita",

year = "2006",

month = sep,

day = "8",

doi = "10.1143/JJAP.45.L987",

language = "English",

volume = "45",

pages = "L987--L990",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

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TY - JOUR

T1 - Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source

AU - Fujiwara, Yukio

AU - Kondou, Kouji

AU - Nonaka, Hidehiko

AU - Saito, Naoaki

AU - Itoh, Hiroshi

AU - Fujimoto, Toshiyuki

AU - Kurokawa, Akira

AU - Ichimura, Shingo

AU - Tomita, Mitsuhiro

PY - 2006/9/8

Y1 - 2006/9/8

N2 - Tetrairidium dodecacarbonyl, Ir4(CO)12, is a metal cluster complex that has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, secondary ion mass spectrometry (SIMS) of poly(methyl methacrylate) (PMMA) thin films on silicon substrates was performed with a quadrupole mass spectrometer. The secondary ion intensity of PMMA bombarded with Ir4(CO)7+ ions was investigated in the beam energy ranging from 3 to 10 keV at an incident angle of 45°. For comparison, bombardment with oxygen ions, O2+, was also tested. It was confirmed that the use of Ir4(CO)7 + ions enhanced secondary ion intensity by at least one order of magnitude compared with that of O2+ ions. Experimental results also showed that secondary ion intensity increased with beam energy; particularly, high-mass secondary ion intensity markedly increased.

AB - Tetrairidium dodecacarbonyl, Ir4(CO)12, is a metal cluster complex that has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, secondary ion mass spectrometry (SIMS) of poly(methyl methacrylate) (PMMA) thin films on silicon substrates was performed with a quadrupole mass spectrometer. The secondary ion intensity of PMMA bombarded with Ir4(CO)7+ ions was investigated in the beam energy ranging from 3 to 10 keV at an incident angle of 45°. For comparison, bombardment with oxygen ions, O2+, was also tested. It was confirmed that the use of Ir4(CO)7 + ions enhanced secondary ion intensity by at least one order of magnitude compared with that of O2+ ions. Experimental results also showed that secondary ion intensity increased with beam energy; particularly, high-mass secondary ion intensity markedly increased.

KW - Ion beam

KW - Lr(CO)

KW - Metal cluster complex

KW - Organic film

KW - PMMA

KW - Poly(methyl methacrylate)

KW - Polymer

KW - SIMS

KW - Sputtering

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U2 - 10.1143/JJAP.45.L987

DO - 10.1143/JJAP.45.L987

M3 - Article

AN - SCOPUS:33748809290

SN - 0021-4922

VL - 45

SP - L987-L990

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

IS - 33-36

ER -

Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source

Abstract

Keywords

ASJC Scopus subject areas

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