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Self-limiting laser thermal process for ultra-shallow junction formation of 50-nm gate CMOS
Akio Shima*, Hiroshi Ashihara, Toshiyuki Mine, Yasushi Goto, Masatada Horiuchi, Yun Wang, Somit Talwar, Atsushi Hiraiwa
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
22
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(Scopus)