Silicon on thin buried oxide (SOTB) technology for ultralow-power applications

N. Sugii, T. Iwamatsu, Y. Yamamoto, H. Makiyama, H. Shinohara, H. Aono, H. Oda, S. Kamohara, Y. Yamaguchi, T. Mizutani, Toshiro Hiramoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Demands for low-power CMOS devices are still increasing. Ultralow-voltage operation of CMOS with maximum power efficiency can extend the opportunity of using the electron devices to power-conscious applications such as ubiquitous sensor network, etc. The main issues for low-power (highly efficient) operation of the modern scaled CMOS are reducing variability and enabling adaptive control of circuit performance and power consumption under the operation at voltages as low as possible. In order to solve these issues, we are developing the silicon-on-thin-buried-oxide (SOTB) transistors. We show features of the SOTB, transistor technology dedicated for ultralow-voltage (down to 0.4 V) operation, circuit design applicable for SOTB and we discuss on the performance projection and ULV application with SOTB.

Original languageEnglish
Title of host publication2013 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, ULSIC vs. TFT 4
Pages189-196
Number of pages8
Edition1
DOIs
Publication statusPublished - 2013
Externally publishedYes
Event4th International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, ULSIC vs. TFT 2013 - Villard-de-Lans, France
Duration: 2013 Jul 72013 Jul 12

Publication series

NameECS Transactions
Number1
Volume54
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other4th International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors, ULSIC vs. TFT 2013
Country/TerritoryFrance
CityVillard-de-Lans
Period13/7/713/7/12

ASJC Scopus subject areas

  • Engineering(all)

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