Abstract
We have demonstrated a novel procedure for fabricating high-κ dielectric nanofilms by using a titania nanosheet as a building block. The layer-by-layer assembly of titania nanosheets using an atomically flat SrRuO3 substrate is advantageous as a means of fabricating atomically uniform multilayer high-κ nanofilms. High-resolution transmission electron microscopy revealed that these multilayer nanofilms are composed of a well-ordered lamellar structure without an interfacial dead layer. These nanofilms exhibited both high dielectric constant (εr ∼ 125) and low leakage current density (J < 10-7A/cm2) even for thicknesses as low as 10nm. These results indicate that the titania nanosheet is a very promising candidate as a high-κ nanoblock, and its bottom-up fabrication provides new opportunities for the development of high-κ devices.
Original language | English |
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Pages (from-to) | 6979-6983 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 46 |
Issue number | 10 B |
DOIs | |
Publication status | Published - 2007 Oct 22 |
Externally published | Yes |
Keywords
- High-κ dielectrics
- Layer-by-layer assembly
- Titania nanosheet
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)