Spatial distribution of defects in high-purity silica glasses

Ryoichi Tohmon; Akihiro Ikeda; Yasushi Shimogaichi; Shuji Munekuni; Yoshimichi Ohki; Kaya Nagasawa; Yoshimasa Hama

doi:10.1063/1.345681

Spatial distribution of defects in high-purity silica glasses

Ryoichi Tohmon^*, Akihiro Ikeda, Yasushi Shimogaichi, Shuji Munekuni, Yoshimichi Ohki, Kaya Nagasawa, Yoshimasa Hama

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.

Original language	English
Pages (from-to)	1302-1306
Number of pages	5
Journal	Journal of Applied Physics
Volume	67
Issue number	3
DOIs	https://doi.org/10.1063/1.345681
Publication status	Published - 1990 Dec 1

ASJC Scopus subject areas

Physics and Astronomy(all)

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abstract = "The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.",

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AU - Tohmon, Ryoichi

AU - Ikeda, Akihiro

AU - Shimogaichi, Yasushi

AU - Munekuni, Shuji

AU - Ohki, Yoshimichi

AU - Nagasawa, Kaya

AU - Hama, Yoshimasa

PY - 1990/12/1

Y1 - 1990/12/1

N2 - The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.

AB - The spatial distribution of defects and impurities in a variety of high-purity silica glass manufactured by different methods are studied. The defects investigated include those found in the as-manufactured glass (oxygen vacancy and peroxy linkage), as well as those induced by ionizing radiation or ultraviolet light (E' center and oxygen hole centers). A significant difference is observed in the distribution between silica manufactured by different methods. Furthermore, the defects induced by ionizing radiation or ultraviolet light have a spatial distribution relative to the geometry of the as-manufactured boule, suggesting that these defects arise primarily from the activation of preexisting precursors.

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Spatial distribution of defects in high-purity silica glasses

Abstract

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