Abstract
We formerly developed the "assembly method" for analyzing the line-edge and line-width roughness (LER/LWR) that has a long-range correlation beyond the conventional analysis limit. In the method, we repeatedly assembled virtual long lines by gathering line segments, which were arbitrarily disposed on actual long lines and by randomly changing their combination and order, permitting the assembled lines to share the same line segments. Then, we obtained the PSD of the LER/LWR of the assembled lines considering the lines as seamless. We also derived an analytic formula of the assembled-line PSDs. This formula excellently agreed with experimental PSDs. In this report, we propose guidelines for suppressing the statistical-noise effect on the assembly method for the purpose of accurately analyzing the long-range- correlated LER/LWR. The guidelines will greatly help shed light on the long-range correlation, which causes the variability even in large devices but has long been veiled due to the lack of metrology.
Original language | English |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 7971 |
DOIs | |
Publication status | Published - 2011 |
Externally published | Yes |
Event | Metrology, Inspection, and Process Control for Microlithography XXV - San Jose, CA Duration: 2011 Feb 28 → 2011 Mar 3 |
Other
Other | Metrology, Inspection, and Process Control for Microlithography XXV |
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City | San Jose, CA |
Period | 11/2/28 → 11/3/3 |
Keywords
- correlation length
- LER
- line edge roughness
- line width roughness
- LWR
- noise
- power spectrum
- PSD
ASJC Scopus subject areas
- Applied Mathematics
- Computer Science Applications
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics