Stress release drives growth transition of quaterrylene thin films on Sio2 surfaces

Ryoma Hayakawa, XueNa Zhang, Helmut Dosch, Nobuya Hiroshiba, Toyohiro Chikyow, Yutaka Wakayama*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

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Chemical Compounds

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Physics & Astronomy