Abstract
The applicability of tandem mass spectrometry to the quality analysis of metal-surface protect surfactants without any pretreatment or purification of the sample solution was investigated. Three typical spectra were constructed and verified by FAB CID-MS/MS using sodium n-dodecylsulfate (anionic surfactant), tetradecyl dimethylbenzylammonium chloride (cationic surfactant) and heptaethylene glycol mono-n-dodecyl ether (nonionic surfactant) as a model. The FAB CID-MS/MS spectra of metal-surface protect surfactants provided useful structural information that analyte surfactants have a polyoxyethylene structure, which has been identified as a nonionic surfactant. The authors concluded that FAB CID-MS/MS will be a good analytical method for direct quality analysis without any pretreatment or purification of the metal-surface protect surfactant for industrial use.
| Original language | English |
|---|---|
| Pages (from-to) | 797 |
| Number of pages | 1 |
| Journal | BUNSEKI KAGAKU |
| Volume | 48 |
| Issue number | 8 |
| DOIs | |
| Publication status | Published - 1999 |
Keywords
- Charge-remote fragmentation
- Fast atom bombardment
- Mass spectrometry
- Surfactant
- Tandem mass spectrometry
ASJC Scopus subject areas
- Analytical Chemistry