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Structural defects in amorphous silicon oxynitride and silicon nitride
H. Kato
*
,
Y. Ohki
*
Corresponding author for this work
Kagami Memorial Research Institute for Materials Science and Technology
Research output
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Contribution to journal
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Review article
›
peer-review
1
Citation (Scopus)
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Physics & Astronomy
oxynitrides
87%
optoelectronic devices
72%
silicon nitrides
71%
amorphous silicon
67%
electron paramagnetic resonance
66%
photoluminescence
51%
irradiation
46%
hydrogen
45%
electric fields
42%
characterization
40%
photons
40%
defects
40%
electronics
38%
Chemical Compounds
Amorphous Silicon
99%
Nitride
70%
Photon
70%
Optoelectronics
66%
Electric Field
65%
Photoluminescence
56%
Hydrogen
37%
Application
23%
Engineering & Materials Science
Amorphous silicon
100%
Silicon nitride
88%
Defects
50%
Photoluminescence
39%
Paramagnetic resonance
33%
Photons
28%
Optoelectronic devices
28%
Irradiation
25%
Electric fields
22%
Characterization (materials science)
21%
Hydrogen
19%