Structure of Heteroepitaxial Nickel Electrodeposits on the Iron Substrate

Kazuhito Kamei*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


With special attention to the fine structure of electrodeposits and the deposit/substrate interface, the heteroepitaxial growth of nickel electrodeposits on a polycrystalline iron substrate has been studied mainly by transmission electron microscopy. The nickel deposits grow heteroepitaxially even at such a high current density as 500 A/m2 on a chemically cleaned substrate iron. The crystallographic orientation relationship between the nickel deposits and the iron substrate is that of Kurdjumov-Sachs, i.e. (110)α⁄⁄(111)Ni, [111]α⁄⁄[110]Ni. The nickel heteroepitaxial deposits consist of columnar crystals which contain dense dislocations at the interface. There dislocations are introduced in order to reduce the misfit strain at the interface.

Original languageEnglish
Pages (from-to)251-257
Number of pages7
Journalmaterials transactions, jim
Issue number4
Publication statusPublished - 1989
Externally publishedYes


  • electrodeposition
  • epitaxial growth
  • heteroepitaxy
  • iron
  • nickel
  • plating
  • transmission electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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