TY - GEN
T1 - Study of current induced magnetic domain wall movement with extremely low energy consumption by micromagnetic simulation
AU - Kawabata, K.
AU - Tanizawa, M.
AU - Ishikawa, K.
AU - Inoue, Y.
AU - Inuishi, M.
AU - Nishimura, T.
PY - 2011/11/1
Y1 - 2011/11/1
N2 - We study the velocity and energy consumption of current induced magnetic domain wall (DW) movement, which is a new paradigm in spintronics devices such as a next generation MRAM and race track memory, by LLG (Landau-Lifshitz- Gilbert) micromagnetic simulation. It is found that DW velocity is almost the same in current in magnetic thin film plane(CIP) and current perpendicular to plane (CPP-Perp.). On the other hand, the energy consumption is much lower in CPP-Perp. than CIP. These results show that the CPP-Perp. structure has potential solutions for high speed and low energy consumption applications.
AB - We study the velocity and energy consumption of current induced magnetic domain wall (DW) movement, which is a new paradigm in spintronics devices such as a next generation MRAM and race track memory, by LLG (Landau-Lifshitz- Gilbert) micromagnetic simulation. It is found that DW velocity is almost the same in current in magnetic thin film plane(CIP) and current perpendicular to plane (CPP-Perp.). On the other hand, the energy consumption is much lower in CPP-Perp. than CIP. These results show that the CPP-Perp. structure has potential solutions for high speed and low energy consumption applications.
KW - MRAM
KW - domain wall movement
KW - spin transfer torque
UR - http://www.scopus.com/inward/record.url?scp=80054991150&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=80054991150&partnerID=8YFLogxK
U2 - 10.1109/SISPAD.2011.6035048
DO - 10.1109/SISPAD.2011.6035048
M3 - Conference contribution
AN - SCOPUS:80054991150
SN - 9781612844169
T3 - International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
SP - 55
EP - 58
BT - 2011 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2011
T2 - 2011 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2011
Y2 - 8 September 2011 through 10 September 2011
ER -