TY - JOUR
T1 - Study on a conductive channel of a Pt/NiO/Pt ReRAM by bias application with/without a magnetic field
AU - Koga, Yuki
AU - Hasegawa, Tsuyoshi
N1 - Publisher Copyright:
© 2021 The Japan Society of Applied Physics.
PY - 2021/6
Y1 - 2021/6
N2 - Resistive random access memories (ReRAMs) have attracted much attention as a next-generation non-volatile memory. We focused on a NiO-based ReRAM in this study because it contains the magnetic element Ni. As-fabricated devices exhibit ideal memristive operation. When bias was swept in one polarity, the resistance decreased by repeating the bias sweeping. Conversely, by changing the polarity of the sweeping bias, the resistance gradually increased by repeating the bias sweeping. A steep increase in current was observed when continuing bias sweeping in the polarity that decreased the resistance. The resistance after that was lower than 12.9 kΩ, which suggests the formation of a Ni atom chain. Conductance quantization, with a unit of 2e 2/h, also suggested the said formation. When a magnetic field was applied, the unit of conductance quantization appeared to change from 2e 2/h to e 2/h.
AB - Resistive random access memories (ReRAMs) have attracted much attention as a next-generation non-volatile memory. We focused on a NiO-based ReRAM in this study because it contains the magnetic element Ni. As-fabricated devices exhibit ideal memristive operation. When bias was swept in one polarity, the resistance decreased by repeating the bias sweeping. Conversely, by changing the polarity of the sweeping bias, the resistance gradually increased by repeating the bias sweeping. A steep increase in current was observed when continuing bias sweeping in the polarity that decreased the resistance. The resistance after that was lower than 12.9 kΩ, which suggests the formation of a Ni atom chain. Conductance quantization, with a unit of 2e 2/h, also suggested the said formation. When a magnetic field was applied, the unit of conductance quantization appeared to change from 2e 2/h to e 2/h.
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U2 - 10.35848/1347-4065/abe7c1
DO - 10.35848/1347-4065/abe7c1
M3 - Article
AN - SCOPUS:85102475608
SN - 0021-4922
VL - 60
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - SC
M1 - SCCF03
ER -