TY - JOUR
T1 - Study on electron-beam-induced reactions of methyl α-allyloxymethyl acrylic polymer
AU - Hosaka, Yuji
AU - Kondoh, Takafumi
AU - Oyama, Tomoko Gowa
AU - Uchida, Tomoya
AU - Taguchi, Mitsumasa
AU - Yoshida, Yoichi
AU - Washio, Masakazu
N1 - Funding Information:
1 Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology (QST), 1233 Watanuki-machi, Takasaki-shi, Gunma 370-1292, Japan 2 The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki-shi, Osaka 567-0047, Japan 3 Waseda Research Institute for Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan *hosaka.yuji@qst.go.jp **washiom@waseda.jp
Publisher Copyright:
© 2018SPST.
PY - 2018
Y1 - 2018
N2 - α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.
AB - α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF) rings in their main chain and acrylic units in their side chains. AMA polymers are generally cured by ultraviolet light with photopolymerization initiators and are used as adhesive agents, sealants, inks, and resist materials owing to its high adhesiveness, transparency, and thermal tolerance. In this study, the applicability of methyl AMA polymer (PMeAMA) as an electron beam (EB) resist was investigated. PMeAMA performs as a negative-tone resist upon EB irradiation, and the sensitivity of PMeAMA was determined to be 300–400 μC/cm2 for a 55 kV EB. This value is comparable to those of poly(methyl methacrylate) (PMMA) and hydrogen silsesquioxane. The radiation-induced early reactions of PMeAMA in nanosecond time scale were studied by using nanosecond pulse radiolysis. The electron scavenging capability of PMeAMA was confirmed, and its electron scavenging rate constant was comparable to that of PMMA. The reactivity of PMeAMA with solvent radical cations was observed in dichloromethane solution.
KW - Electron beam resist
KW - Poly(methyl methacrylate)
KW - Pulse radiolysis
KW - Tetrahydrofuran
KW - α-Allyloxymethyl acrylic polymer
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U2 - 10.2494/photopolymer.31.85
DO - 10.2494/photopolymer.31.85
M3 - Article
AN - SCOPUS:85053276673
SN - 0914-9244
VL - 31
SP - 85
EP - 90
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
IS - 1
ER -