TEM analysis on nanovoid formation in annealed amorphous oxides

Ryusuke Nakamura*, Takehiro Shudo, Akihiko Hirata, Manabu Ishimaru, Hideo Nakajima

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution


Formation behavior of nanovoids during the annealing of amorphous Al 2O3 and WO3 was studied by transmission electron microscopy. The density and size of the voids in Al2O 3 and WO3 increase with increasing annealing temperature from 973 to 1123 K and from 573 to 673 K, respectively. It is suggested that the formation of nanovoids during annealing is attributed to the large difference in density between as-deposited amorphous and crystalline oxides.

Original languageEnglish
Title of host publicationEco-Materials Processing and Design XII
PublisherTrans Tech Publications Ltd
Number of pages4
ISBN (Print)9783037852224
Publication statusPublished - 2011
Externally publishedYes

Publication series

NameMaterials Science Forum
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752


  • Amorphous oxides
  • Crystallization
  • Nanoporous

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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