TEM characterization of Co-Al-O nano-granular TMR film

K. Kamei*, M. Yonemura, K. Hanafusa

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Co-Al-O film was fabricated using the reactive r.f. magnetron sputtering technique. A maximum magnetoresistance (MR) of approximately 7% was established through optimizing the sputter deposition conditions such as sputter power and gas flow rate. TEM characterization of the film revealed a nano-granular structure that consisted of ferromagnetic grains with grain diameters on the order of several nm together with non-magnetic grain boundary layers with the thickness on the order of less than 1 nm. The large MR was attributed to electron tunneling thorough this very thin grain boundary layer between individual ferromagnetic grains.

Original languageEnglish
Pages (from-to)569-574
Number of pages6
JournalJournal of Materials Science: Materials in Medicine
Issue number10
Publication statusPublished - 2001 Oct
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • General Materials Science
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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