TY - JOUR
T1 - Temporal profile measurement of an electron bunch with the two-cell rf deflecting cavity at Waseda University
AU - Sakaue, Kazuyuki
AU - Nishimura, Yuichi
AU - Nishiyama, Masahiro
AU - Takahashi, Takenoshin
AU - Washio, Masakazu
AU - Takatomi, Toshikazu
AU - Urakawa, Junji
N1 - Publisher Copyright:
© 2015 The Japan Society of Applied Physics.
PY - 2015/2/1
Y1 - 2015/2/1
N2 - Our group at Waseda University developed an rf deflector system for measuring longitudinal. In this study we evaluated the temporal resolution of an S-band two-cell rf deflector cavity built into the system and performed a series of longitudinal profile measurements of electron bunch from an rf photocathode gun. The rf deflector system achieved a temporal resolution of 147.6 fs (rms), the value gave in close agreement with the design specification. We present our experimental results and discussion how the temporal profile was influenced by the rf electric field and space charge effect in the electron bunch from the rf photo cathode gun. Our results agreed with the results of a beam tracking simulation. The successful results of longitudinal profile measurements in this study confirm that our deflector system will be quite useful for improving an rf electron gun cavities.
AB - Our group at Waseda University developed an rf deflector system for measuring longitudinal. In this study we evaluated the temporal resolution of an S-band two-cell rf deflector cavity built into the system and performed a series of longitudinal profile measurements of electron bunch from an rf photocathode gun. The rf deflector system achieved a temporal resolution of 147.6 fs (rms), the value gave in close agreement with the design specification. We present our experimental results and discussion how the temporal profile was influenced by the rf electric field and space charge effect in the electron bunch from the rf photo cathode gun. Our results agreed with the results of a beam tracking simulation. The successful results of longitudinal profile measurements in this study confirm that our deflector system will be quite useful for improving an rf electron gun cavities.
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U2 - 10.7567/JJAP.54.026301
DO - 10.7567/JJAP.54.026301
M3 - Article
AN - SCOPUS:84923196966
SN - 0021-4922
VL - 54
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 2
M1 - 026301
ER -