The effect of the deposition conditions on the electrodeposition of Si nanopillars in TMHATFSI

Yoko Ishibashi, Takahiro Akiyoshi, Jason Komadina, Yasuhiro Fukunaka, Takayuki Homma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Si nanopillars were prepared by electrodeposition from SiCl4 in an ionic liquid, specifically tri-methyl-n-hexyl ammonium bis- (trifluorosulfonyl) imide (TMHATFSI), and the effects of the various deposition conditions, such as bath temperature and deposition potential, were investigated. For the preparation of the patterned substrates, UV-nanoimprint lithography was employed. The thickness of resist was 90-100 nm, mold feature diameter was 150 nm, with a pitch of 450 nm. As a result, compact Si nanopillars were uniformly electrodeposited, and it was indicated that their morphology were affected mostly by the bath temperature.

Original languageEnglish
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages117-126
Number of pages10
Edition48
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2013

Publication series

NameECS Transactions
Number48
Volume50
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

ASJC Scopus subject areas

  • General Engineering

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