TY - JOUR
T1 - The immobilization of DNA on microstructured patterns fabricated by maskless lithography
AU - Zhang, Guo Jun
AU - Tanii, Takashi
AU - Zako, Tamotsu
AU - Funatsu, Takashi
AU - Ohdomari, Iwao
N1 - Funding Information:
We thank Mr. Goto in Materials Characterization Central Laboratory at Waseda University for assistance with XPS experiment. This work is supported in part by Japan Society for the Promotion of Science (JSPS), and a Grant-in-Aid for Center of Excellence (COE) Research from the Ministry of Education, Culture, Sports, Science and Technology.
PY - 2004/2/1
Y1 - 2004/2/1
N2 - The site-directed covalent immobilization of amino-terminated DNA oligonucleotides on microstructured patterns at silicon surfaces generated by the methodology of electron beam (EB) lithography was investigated. The microstructured patterns characterized by scanning electron microscopy (SEM) revealed remarkably regular in size and shape. After treatment with different time of activation (10s and 30min), self-assembled layers of 3-aminopropyltriethoxysilane (APTES) on silicon surfaces characterized by X-ray photoelectron spectroscopy (XPS) were demonstrated to obtain similar N 1s peaks. The immobilization specificity was evaluated by means of 5′ amino-modified oligonucleotides labeled with Cy 5 at its 3′ end attached onto microstructured patterns. The high-density DNA array (40,000 spots per cm2) was achieved, and the resulting array exhibited the specific binding due to DNA-DNA interaction. Additional studies indicated hardly visible signals when non-complementary probes were immobilized on the microstructured patterns. The deposition of DNA in a microstructure array using this technique is precise and homogeneous, showing the potential for high-density information storage and the miniaturization for biosensors and biochips.
AB - The site-directed covalent immobilization of amino-terminated DNA oligonucleotides on microstructured patterns at silicon surfaces generated by the methodology of electron beam (EB) lithography was investigated. The microstructured patterns characterized by scanning electron microscopy (SEM) revealed remarkably regular in size and shape. After treatment with different time of activation (10s and 30min), self-assembled layers of 3-aminopropyltriethoxysilane (APTES) on silicon surfaces characterized by X-ray photoelectron spectroscopy (XPS) were demonstrated to obtain similar N 1s peaks. The immobilization specificity was evaluated by means of 5′ amino-modified oligonucleotides labeled with Cy 5 at its 3′ end attached onto microstructured patterns. The high-density DNA array (40,000 spots per cm2) was achieved, and the resulting array exhibited the specific binding due to DNA-DNA interaction. Additional studies indicated hardly visible signals when non-complementary probes were immobilized on the microstructured patterns. The deposition of DNA in a microstructure array using this technique is precise and homogeneous, showing the potential for high-density information storage and the miniaturization for biosensors and biochips.
KW - DNA
KW - Electron beam lithography
KW - Fabrication
KW - Fluorescence detection
KW - Immobilization
KW - Microstructure patterns
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U2 - 10.1016/j.snb.2003.08.023
DO - 10.1016/j.snb.2003.08.023
M3 - Article
AN - SCOPUS:1642478039
SN - 0925-4005
VL - 97
SP - 243
EP - 248
JO - Sensors and Actuators, B: Chemical
JF - Sensors and Actuators, B: Chemical
IS - 2-3
ER -