Theoretical analysis for thermal chemical vapor deposition from Tetraethoxysilane using a semi-empirical molecular orbital method

Mitsuhito Hirota*, Nagahiro Saito, Takahiro Ishizaki, Akio Fuwa

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Fingerprint

    Dive into the research topics of 'Theoretical analysis for thermal chemical vapor deposition from Tetraethoxysilane using a semi-empirical molecular orbital method'. Together they form a unique fingerprint.

    Engineering & Materials Science

    Chemical Compounds

    Physics & Astronomy