Theoretical and experimental analysis on Ar Implantation-Induced Quantum Dot Intermixing for 1550 nm-Band Photonic Integrated Circuit

A. Matsumoto, Y. Akashi, S. Isawa, T. Umezawa, Y. Matsushima, K. Utaka

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this study, we theoretically and experimentally investigated an Ar ion implantation-induced quantum dot intermixing and its physical mechanism using photoluminescence and numerical simulations for the OD based monolithic PICs.

Original languageEnglish
Title of host publication2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580576
DOIs
Publication statusPublished - 2019 May
Event2019 Conference on Lasers and Electro-Optics, CLEO 2019 - San Jose, United States
Duration: 2019 May 52019 May 10

Publication series

Name2019 Conference on Lasers and Electro-Optics, CLEO 2019 - Proceedings

Conference

Conference2019 Conference on Lasers and Electro-Optics, CLEO 2019
Country/TerritoryUnited States
CitySan Jose
Period19/5/519/5/10

ASJC Scopus subject areas

  • Spectroscopy
  • Industrial and Manufacturing Engineering
  • Safety, Risk, Reliability and Quality
  • Management, Monitoring, Policy and Law
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging
  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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