Thin films of SmCo5 with very high perpendicular magnetic anisotropy

J. Sayama; K. Mizutani; T. Asahi; T. Osaka

doi:10.1063/1.1829792

Thin films of SmCo₅ with very high perpendicular magnetic anisotropy

J. Sayama^*, K. Mizutani, T. Asahi, T. Osaka

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

77 Citations (Scopus)

Abstract

Thin films of SmCo₅ with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 10⁷ erg/cm³, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo₅(002) reflection was 3.1°.

Original language	English
Pages (from-to)	5640-5642
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	23
DOIs	https://doi.org/10.1063/1.1829792
Publication status	Published - 2004 Dec 6

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.1829792

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title = "Thin films of SmCo5 with very high perpendicular magnetic anisotropy",

abstract = "Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.",

author = "J. Sayama and K. Mizutani and T. Asahi and T. Osaka",

note = "Funding Information: This work was carried out at the “Center for Practical Nano-Chemistry” for the 21C-COE Programme, and was partly supported by the Grant-in-Aid for COE Research and the Special Coordination Funds for Promoting Science and Technology from the Ministry of Education, Culture, Sports, Science, and Technology, Japan. The authors express their gratitude to Dr. Y. Kitamoto, Dr. H. Sakuma, and Ms. R. Minami, Tokyo Institute of Technology, for their cooperation in the torque magnetometer measurement. The authors would like to thank Dr. Y. Okinaka, Waseda University, for his useful comments on their manuscript.",

year = "2004",

month = dec,

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doi = "10.1063/1.1829792",

language = "English",

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journal = "Applied Physics Letters",

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T1 - Thin films of SmCo5 with very high perpendicular magnetic anisotropy

AU - Sayama, J.

AU - Mizutani, K.

AU - Asahi, T.

AU - Osaka, T.

N1 - Funding Information: This work was carried out at the “Center for Practical Nano-Chemistry” for the 21C-COE Programme, and was partly supported by the Grant-in-Aid for COE Research and the Special Coordination Funds for Promoting Science and Technology from the Ministry of Education, Culture, Sports, Science, and Technology, Japan. The authors express their gratitude to Dr. Y. Kitamoto, Dr. H. Sakuma, and Ms. R. Minami, Tokyo Institute of Technology, for their cooperation in the torque magnetometer measurement. The authors would like to thank Dr. Y. Okinaka, Waseda University, for his useful comments on their manuscript.

PY - 2004/12/6

Y1 - 2004/12/6

N2 - Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.

AB - Thin films of SmCo5 with extraordinarily high perpendicular magnetic anisotropy were prepared by introducing a Cu/Ti dual underlayer and controlling the substrate temperature during the sputter deposition. Under optimized conditions, the magnetic anisotropy constant reached 4.0 × 107 erg/cm3, and the coercivity and the remanence ratio in the direction perpendicular to the film surface were 12.0 kOe and unity, respectively. The high perpendicular magnetic anisotropy is attributed to the high degree of preferred orientation of the c axis; the full width at half maximum in the rocking curve of SmCo5(002) reflection was 3.1°.

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DO - 10.1063/1.1829792

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 23

ER -

Thin films of SmCo₅ with very high perpendicular magnetic anisotropy

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