Three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars fabricated by simple photolithography

This paper presents a fabrication method of three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars using simple photolithography. The width and height of micro-pillars were 10 um and 200 μm (the aspect ratio was about 20). The SU-8 coated on the Cr patterned Pyrex glass substrate was exposed from the backside with an angle to fabricate inclined micro-pillars. The 3-D micro-structures were fabricated by repeating the backside exposure with different angles. The shape of the micro-structure was denned by the number of exposures and the UV irradiation angles. The complicated micro-structures were fabricated by multi-angle exposures around two axes, as well as around one axis.