Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

Yu Luo; Nelson Yee; Qingfang Shi; Baoxin Zhang; Yibo Mo; Gary S. Chottiner; Daniel Alberto Scherson

doi:10.1149/1.1376120

Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

Yu Luo^*, Nelson Yee, Qingfang Shi, Baoxin Zhang, Yibo Mo, Gary S. Chottiner, Daniel Alberto Scherson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.

Original language	English
Journal	Journal of the Electrochemical Society
Volume	148
Issue number	7
DOIs	https://doi.org/10.1149/1.1376120
Publication status	Published - 2001 Jul 1
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films
Electrochemistry
Materials Chemistry

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1149/1.1376120

Cite this

@article{a1e6452b98434d9a9ef86e9917a513a5,

title = "Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition",

abstract = "Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.",

author = "Yu Luo and Nelson Yee and Qingfang Shi and Baoxin Zhang and Yibo Mo and Chottiner, {Gary S.} and Scherson, {Daniel Alberto}",

year = "2001",

month = jul,

day = "1",

doi = "10.1149/1.1376120",

language = "English",

volume = "148",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Electrochemical Society, Inc.",

number = "7",

}

TY - JOUR

T1 - Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

AU - Luo, Yu

AU - Yee, Nelson

AU - Shi, Qingfang

AU - Zhang, Baoxin

AU - Mo, Yibo

AU - Chottiner, Gary S.

AU - Scherson, Daniel Alberto

PY - 2001/7/1

Y1 - 2001/7/1

N2 - Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.

AB - Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.

UR - http://www.scopus.com/inward/record.url?scp=0442282028&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0442282028&partnerID=8YFLogxK

U2 - 10.1149/1.1376120

DO - 10.1149/1.1376120

M3 - Article

AN - SCOPUS:0442282028

SN - 0013-4651

VL - 148

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

IS - 7

ER -

Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

Abstract

ASJC Scopus subject areas

UN SDGs

Access to Document

Other files and links

Fingerprint

Cite this