Transmission electron microscopic study of electroless nickel-molybdenum-boron alloy films

Tetsuya Osaka; Katsuya Arai; Naganori Masubuchi; Yohtaro Yamazaki; Tatsuru Namikawa

doi:10.1143/JJAP.28.866

Transmission electron microscopic study of electroless nickel-molybdenum-boron alloy films

Tetsuya Osaka, Katsuya Arai, Naganori Masubuchi, Yohtaro Yamazaki, Tatsuru Namikawa

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

The structure of amorphous and crystalline electroless Ni舑Mo舑B films was studied by transmission electron microscopy (TEM). The amorphous film in as-deposited conditions was of a completely disordered state with few crystalline regions. This film crystallized by means of nucleation after 300ŶC annealing; the produced nuclei grew large after 500ŶC annealing. Two crystalline films in the as-deposited state, plated from 0.005 and 0.010 mol dm^-3 Na₂MoO₄ concentration baths, showed different annealing behavior even though they had almost identical Ni and Mo composition. The former contained amorphous-like regions corresponding to an intermediate state between the amorphous and the crystalline. The latter film was so stable against annealing that the structure of small grains was maintained after 500°C annealing.

Original language	English
Pages (from-to)	866-871
Number of pages	6
Journal	Japanese journal of applied physics
Volume	28
Issue number	5R
DOIs	https://doi.org/10.1143/JJAP.28.866
Publication status	Published - 1989 May
Externally published	Yes

Keywords

Annealing effect
Electroless plating
Microstructure
Nickel-molybdenum alloy
Transmission electron microscopy

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.28.866

Cite this

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title = "Transmission electron microscopic study of electroless nickel-molybdenum-boron alloy films",

abstract = "The structure of amorphous and crystalline electroless Ni舑Mo舑B films was studied by transmission electron microscopy (TEM). The amorphous film in as-deposited conditions was of a completely disordered state with few crystalline regions. This film crystallized by means of nucleation after 300ŶC annealing; the produced nuclei grew large after 500ŶC annealing. Two crystalline films in the as-deposited state, plated from 0.005 and 0.010 mol dm-3 Na2MoO4 concentration baths, showed different annealing behavior even though they had almost identical Ni and Mo composition. The former contained amorphous-like regions corresponding to an intermediate state between the amorphous and the crystalline. The latter film was so stable against annealing that the structure of small grains was maintained after 500°C annealing.",

keywords = "Annealing effect, Electroless plating, Microstructure, Nickel-molybdenum alloy, Transmission electron microscopy",

author = "Tetsuya Osaka and Katsuya Arai and Naganori Masubuchi and Yohtaro Yamazaki and Tatsuru Namikawa",

year = "1989",

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TY - JOUR

T1 - Transmission electron microscopic study of electroless nickel-molybdenum-boron alloy films

AU - Osaka, Tetsuya

AU - Arai, Katsuya

AU - Masubuchi, Naganori

AU - Yamazaki, Yohtaro

AU - Namikawa, Tatsuru

PY - 1989/5

Y1 - 1989/5

N2 - The structure of amorphous and crystalline electroless Ni舑Mo舑B films was studied by transmission electron microscopy (TEM). The amorphous film in as-deposited conditions was of a completely disordered state with few crystalline regions. This film crystallized by means of nucleation after 300ŶC annealing; the produced nuclei grew large after 500ŶC annealing. Two crystalline films in the as-deposited state, plated from 0.005 and 0.010 mol dm-3 Na2MoO4 concentration baths, showed different annealing behavior even though they had almost identical Ni and Mo composition. The former contained amorphous-like regions corresponding to an intermediate state between the amorphous and the crystalline. The latter film was so stable against annealing that the structure of small grains was maintained after 500°C annealing.

AB - The structure of amorphous and crystalline electroless Ni舑Mo舑B films was studied by transmission electron microscopy (TEM). The amorphous film in as-deposited conditions was of a completely disordered state with few crystalline regions. This film crystallized by means of nucleation after 300ŶC annealing; the produced nuclei grew large after 500ŶC annealing. Two crystalline films in the as-deposited state, plated from 0.005 and 0.010 mol dm-3 Na2MoO4 concentration baths, showed different annealing behavior even though they had almost identical Ni and Mo composition. The former contained amorphous-like regions corresponding to an intermediate state between the amorphous and the crystalline. The latter film was so stable against annealing that the structure of small grains was maintained after 500°C annealing.

KW - Annealing effect

KW - Electroless plating

KW - Microstructure

KW - Nickel-molybdenum alloy

KW - Transmission electron microscopy

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Transmission electron microscopic study of electroless nickel-molybdenum-boron alloy films

Abstract

Keywords

ASJC Scopus subject areas

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