Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin

Akinobu Kobayashi; Tomoko Gowa Oyama; Akihiro Oshima; Seiichi Tagawa; Masakazu Washio

doi:10.2494/photopolymer.25.217

Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin

Akinobu Kobayashi^*, Tomoko Gowa Oyama, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.

Original language	English
Pages (from-to)	217-221
Number of pages	5
Journal	Journal of Photopolymer Science and Technology
Volume	25
Issue number	2
DOIs	https://doi.org/10.2494/photopolymer.25.217
Publication status	Published - 2012

Keywords

Crosslinked PTFE
TRaf process
Transparent polymer mold
UV-NIL

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

Access to Document

10.2494/photopolymer.25.217

Cite this

@article{b77971175f594c28a0b6209cd0b392a9,

title = "Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin",

abstract = "Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.",

keywords = "Crosslinked PTFE, TRaf process, Transparent polymer mold, UV-NIL",

author = "Akinobu Kobayashi and Oyama, {Tomoko Gowa} and Akihiro Oshima and Seiichi Tagawa and Masakazu Washio",

year = "2012",

doi = "10.2494/photopolymer.25.217",

language = "English",

volume = "25",

pages = "217--221",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "2",

}

TY - JOUR

T1 - Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin

AU - Kobayashi, Akinobu

AU - Oyama, Tomoko Gowa

AU - Oshima, Akihiro

AU - Tagawa, Seiichi

AU - Washio, Masakazu

PY - 2012

Y1 - 2012

N2 - Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.

AB - Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.

KW - Crosslinked PTFE

KW - TRaf process

KW - Transparent polymer mold

KW - UV-NIL

UR - http://www.scopus.com/inward/record.url?scp=84864967643&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864967643&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.25.217

DO - 10.2494/photopolymer.25.217

M3 - Article

AN - SCOPUS:84864967643

SN - 0914-9244

VL - 25

SP - 217

EP - 221

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 2

ER -

Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this