Abstract
Nonvolatile three-terminal operation, with a very small range of bias sweeping (-80 to 250 mV), a high on/off ratio of up to six orders of magnitude, and a very small gate leakage current (<1 pA), is demonstrated using an Ag (gate)/Ta2O5 (ionic transfer layer)/Pt (source), Pt (drain) three-terminal atomic switch structure.
Original language | English |
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Pages (from-to) | 6029-6033 |
Number of pages | 5 |
Journal | Advanced Materials |
Volume | 27 |
Issue number | 39 |
DOIs | |
Publication status | Published - 2015 Oct 1 |
Keywords
- ReRAM
- atomic switches
- low voltage
- redox
- three terminal
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering