Ultraviolet nanoimprint lithography

Jun Taniguchi*, Noriyuki Unno, Hidetoshi Shinohara, Jun Mizuno, Hiroshi Goto, Nobuji Sakai, Kentaro Tsunozaki, Hiroto Miyake, Norio Yoshino, Kenichi Kotaki

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingChapter


This chapter describes the phenomena of ultraviolet nanoimprint lithography (UV-NIL) transfer process, UV-NIL machine, UV-NIL materials, and evaluation of mold and transfer resin surface. In UV-NIL, a liquid resin having a low viscosity is used, thus, the required transfer pressure is lower than that of thermal NIL. The chapter describes the self-assembled monolayer (SAM) release agent and its coating method. Resin is classified according to the polymerization system into several types: radical polymerization type, ion polymerization type, and ene-thiol type. The properties of resins with different types of curing mechanism and developmental examples are described. The chapter describes what silane coupling agents are, and explains the mechanism by which the agents modify the surface of the substrate.

Original languageEnglish
Title of host publicationNanoimprint Technology
Subtitle of host publicationNanotransfer for Thermoplastic and Photocurable Polymers
Number of pages78
ISBN (Electronic)9781118535059
ISBN (Print)9781118359839
Publication statusPublished - 2013 Jun 18

ASJC Scopus subject areas

  • Engineering(all)


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