Use of process indices for simplification of the description of vapor deposition systems

Yuya Kajikawa*, Suguru Noda, Hiroshi Komiyama

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Vapor deposition is a complex process, including gas-phase, surface, and solid-phase phenomena. Because of the complexity of chemical and physical processes occurring in vapor deposition processes, it is difficult to form a comprehensive, fundamental understanding of vapor deposition and to control such systems for obtaining desirable structures and performance. To overcome this difficulty, we present a method for simplifying the complex description of such systems. One simplification method is to separate complex systems into multiple elements, and determine which of these are important elements. We call this method abridgement. The abridgement method retains only the dominant processes in a description of the system, and discards the others. Abridgement can be achieved by using process indices to evaluate the relative importance of the elementary processes. We describe the formulation and use of these process indices through examples of the growth of continuous films, initial deposition processes, and the formation of the preferred orientation of polycrystalline films. In this paper, we propose a method for representing complex vapor deposition processes as a set of simpler processes.

Original languageEnglish
Pages (from-to)156-163
Number of pages8
JournalMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
Issue number2-3
Publication statusPublished - 2004 Aug 25
Externally publishedYes


  • Abridgement
  • Chemical vapor deposition
  • Elementary process
  • Physical vapor deposition
  • Process index
  • Systems approach

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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