X-ray micro diffraction study on mesostructured silica thin films

Takashi Noma*, Kazuhiro Takada, Hirokatsu Miyata, Atsuo Iida

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

The local structure of highly ordered mesostructured silica films was investigated by using a synchrotron X-ray microbeam and a CCD X-ray detector. Two-dimensional X-ray diffraction patterns clearly showed the detailed arrangement of the mesostructures, in which the hexagonal mesochannels aligned uniaxially in the mesostructured silica films formed on a silica glass substrate with a rubbing-treated thin polyimide coating. The alignment direction was shown to be perpendicular to the rubbing direction. The grazing incidence condition revealed the structural anisotropy of the mesostructures, while normal incidence X-ray diffraction data indicated the in-plane structural uniformity of the films. Extra spots were observed in the diffraction patterns. This suggested that the X-ray beam reflected at the boundary of the mesostructured silica film and the substrate.

Original languageEnglish
Pages (from-to)1021-1025
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume467-468
Issue numberPART II
DOIs
Publication statusPublished - 2001
Externally publishedYes

Keywords

  • Mesostructured silica films
  • X-ray micro diffraction

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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