抄録
Silicon on insulator (SOI) technology is used to fabricate a dynamic random access memory (DRAM) capable of low voltage operation. The device uses a body-pulsed sense amplifier and a body-driven equalizer to accelerate low-voltage speed while partially-depleted and fully depleted transistors are used to enhance on-state current. The device's performance is evaluated experimentally.
本文言語 | English |
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ページ(範囲) | 68-69 |
ページ数 | 2 |
ジャーナル | Digest of Technical Papers - IEEE International Solid-State Circuits Conference |
巻 | 40 |
出版ステータス | Published - 1997 2月 |
外部発表 | はい |
イベント | Proceedings of the 1997 IEEE International Solid-State Circuits Conference, ISSCC - San Francisco, CA, USA 継続期間: 1997 2月 6 → 1997 2月 8 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 電子工学および電気工学