TY - JOUR
T1 - A 373-F 0.21%-Native-BER EE SRAM Physically Unclonable Function with 2-D Power-Gated Bit Cells and {V}_{\text{SS}} Bias-Based Dark-Bit Detection
AU - Liu, Kunyang
AU - Min, Yue
AU - Yang, Xuan
AU - Sun, Hanfeng
AU - Shinohara, Hirofumi
N1 - Funding Information:
Manuscript received May 19, 2019; revised September 18, 2019 and December 5, 2019; accepted December 19, 2019. Date of publication January 13, 2020; date of current version May 27, 2020. This article was approved by Guest Editor Jonathan Chang. This work was supported in part by ROHM Company Ltd., in part by the Kitakyushu Foundation for the Advancement of Industry, Science and Technology (FAIS), and in part by the VLSI Design and Education Center (VDEC), The University of Tokyo, in collaboration with Cadence Design Systems, Inc., and Mentor Graphics, Inc. (Corresponding author: Kunyang Liu.) Kunyang Liu, Hanfeng Sun, and Hirofumi Shinohara are with the Graduate School of Information, Production and Systems, Waseda University, Kitakyushu 808-0135, Japan (e-mail: konyo@fuji.waseda.jp; shinohara.hiro@waseda.jp).
Publisher Copyright:
© 1966-2012 IEEE.
PY - 2020/6
Y1 - 2020/6
N2 - This article presents a highly stable SRAM-based physically unclonable function (PUF) using enhancement-enhancement (EE)-structure bit cells for native stability improvement. The PUF bit cells are power-gated 2-D and are normally in the OFF state, which largely reduces power and is beneficial to attack tolerance. In addition, a dark-bit detection technique based on a lightweight integrated {V}_{\text {SS}} -bias generator is implemented in order to screen out potentially unstable bit cells (dark bits) induced by supply voltage/temperature (VT) variations and other factors. Measured native bit error rate (BER) of prototype chips fabricated in 130-nm standard CMOS is 0.21% at 0.8 V and 23 °C, which is 14 \times better compared with the conventional SRAM-based PUF. After masking the detected dark bits, no bit error (3339 bits \times 500 evaluations) appeared at the worst VT corner across 0.8 to 1.4 V and -40 °C to 120 °C. This technique also eliminated all unstable bits in the accelerated aging test. Both the data before and after dark-bit masking have passed all applicable NIST SP 800-22 randomness tests. The measured operational energy at 0.8 V is 128 fJ/bit and the standby power is 0.44 pW/bit, thanks to the 2-D power-gating scheme. The nMOS-only bit cell is highly compact, with a normalized bit cell area of 373 F 2
AB - This article presents a highly stable SRAM-based physically unclonable function (PUF) using enhancement-enhancement (EE)-structure bit cells for native stability improvement. The PUF bit cells are power-gated 2-D and are normally in the OFF state, which largely reduces power and is beneficial to attack tolerance. In addition, a dark-bit detection technique based on a lightweight integrated {V}_{\text {SS}} -bias generator is implemented in order to screen out potentially unstable bit cells (dark bits) induced by supply voltage/temperature (VT) variations and other factors. Measured native bit error rate (BER) of prototype chips fabricated in 130-nm standard CMOS is 0.21% at 0.8 V and 23 °C, which is 14 \times better compared with the conventional SRAM-based PUF. After masking the detected dark bits, no bit error (3339 bits \times 500 evaluations) appeared at the worst VT corner across 0.8 to 1.4 V and -40 °C to 120 °C. This technique also eliminated all unstable bits in the accelerated aging test. Both the data before and after dark-bit masking have passed all applicable NIST SP 800-22 randomness tests. The measured operational energy at 0.8 V is 128 fJ/bit and the standby power is 0.44 pW/bit, thanks to the 2-D power-gating scheme. The nMOS-only bit cell is highly compact, with a normalized bit cell area of 373 F 2
KW - Dark-bit masking
KW - Internet-of-Things (IoT)
KW - enhancement-enhancement (EE) SRAM
KW - hardware security
KW - physically unclonable function (PUF)
KW - power gating
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U2 - 10.1109/JSSC.2019.2963002
DO - 10.1109/JSSC.2019.2963002
M3 - Article
AN - SCOPUS:85085656606
SN - 0018-9200
VL - 55
SP - 1719
EP - 1732
JO - IEEE Journal of Solid-State Circuits
JF - IEEE Journal of Solid-State Circuits
IS - 6
M1 - 8957039
ER -