A Floating Body Cell (FBC) fully compatible with 90nm CMOS technology(CMOS IV) for 128Mb SOI DRAM

Yoshihiro Minami*, Tomoaki Shino, Atsushi Sakamoto, Tomoki Higashi, Naoki Kusunoki, Katsuyuki Fujita, Kosuke Hatsuda, Takashi Ohsawa, Nobutoshi Aoki, Hiroyoshi Tanimoto, Mutsuo Morikado, Hiroomi Nakajima, Kazumi Inoh, Takeshi Hamamoto, Akihiro Nitayama

*この研究の対応する著者

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

A 128Mb SOI DRAM with FBC (Floating Body Cell) has been successfully developed for the first time. Two technologies have been newly implemented. (i)In order to realize full functionality and good retention characteristics, the well design has been optimized both for the array device and the peripheral circuit. (ii)Cu wiring has been used for Bit Line(BL) and Source Line(SL), which leads to increasing the signal of the worst bit in the array and also realizes the full compatibility with 90nm CMOS Technology.

本文言語English
ホスト出版物のタイトルIEEE International Electron Devices Meeting, 2005 IEDM - Technical Digest
ページ307-310
ページ数4
出版ステータスPublished - 2005 12月 1
外部発表はい
イベントIEEE International Electron Devices Meeting, 2005 IEDM - Washington, DC, MD, United States
継続期間: 2005 12月 52005 12月 7

出版物シリーズ

名前Technical Digest - International Electron Devices Meeting, IEDM
2005
ISSN(印刷版)0163-1918

Other

OtherIEEE International Electron Devices Meeting, 2005 IEDM
国/地域United States
CityWashington, DC, MD
Period05/12/505/12/7

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学
  • 材料化学

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