抄録
This paper presents a novel fabrication method of in-channel three-dimensional micromesh structures using the conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Numbers of exposure and irradiation angle decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of Micro Total Analysis System (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
本文言語 | English |
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ページ | 223-226 |
ページ数 | 4 |
出版ステータス | Published - 2003 7月 23 |
イベント | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems - Kyoto, Japan 継続期間: 2003 1月 19 → 2003 1月 23 |
Conference
Conference | IEEE Sixteenth Annual International Conference on Micro Electro Mechanical Systems |
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国/地域 | Japan |
City | Kyoto |
Period | 03/1/19 → 03/1/23 |
ASJC Scopus subject areas
- 制御およびシステム工学
- 機械工学
- 電子工学および電気工学