Ab initio molecular orbital study on the oxidation mechanism for dimethylamine borane as a reductant for an electroless deposition process

Takayuki Homma*, Hiromi Nakai, Masaaki Onishi, Tetsuya Osaka

*この研究の対応する著者

研究成果: Article査読

40 被引用数 (Scopus)

抄録

The oxidation mechanism of dimethylamine borane (DMAB) as a reductant for an electroless deposition process was studied by an ab initio molecular orbital method. Two types of reaction pathways, via either three-coordinate borane molecules obtained by primary dehydrogenation reactions, or five-coordinate ones by primary additions of OH- for the oxidation of the DMAB, were examined. While the former pathway corresponds to the general oxidation mechanism of the reductant proposed by Meerakker, the present theoretical results support the latter one. Furthermore, it was clarified that an electron emission occurs when OH- adds to the four-coordinate compounds, which agrees with the Meerakker's mechanism. Results of the normal-mode analyses showed that the five-coordinate compounds are the transition states. The optimized geometries of monoanion five-coordinate molecules are nearly bipyramidal. The charge and spin-population analyses indicated that the axial bondings in the five-coordinate compounds are stabilized by the three-center three- or four-electron bondings. During the oxidation reaction of the DMAB, the change in the net charge of B is much smaller than that in the formal oxidation number, which is due to a great covalence. The existences of the five-coordinate borane molecules, which are first clarified by the present study, could be the key points of the catalytic activities of the deposited metals.

本文言語English
ページ(範囲)1774-1778
ページ数5
ジャーナルJournal of Physical Chemistry B
103
10
DOI
出版ステータスPublished - 1999 3月 11

ASJC Scopus subject areas

  • 物理化学および理論化学
  • 表面、皮膜および薄膜
  • 材料化学

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