TY - JOUR
T1 - An effective model of the overshooting effect for multiple-input gates in nanometer technologies
AU - Ding, Li
AU - Huang, Zhangcai
AU - Kurokawa, Atsushi
AU - Wang, Jing
AU - Inoue, Yasuaki
PY - 2014
Y1 - 2014
N2 - With the scaling of CMOS technology into the nanometer regime, the overshooting effect is more and more obvious and has a significant influence to gate delay and power consumption. Recently, researchers have already proposed the overshooting effect models for an inverter. However, the accurate overshooting effect model for multiple-input gates is seldom presented and the existing technology to reduce a multipleinput gate to an inverter is not useful when modeling the overshooting effect for multiple-input gates. Therefore, modeling the overshooting effect for multiple-input gates is proposed in this paper. Firstly, a formula-based model is presented for the overshooting time of 2-input NOR gate. Then, more complicated methods are given to calculate the overshooting time of 3-input NOR gate and other multiple-input gates. The proposed model is verified to have a good agreement, within 3.4% error margin, compared with SPICE simulation results using CMOS 32 nm PTM model.
AB - With the scaling of CMOS technology into the nanometer regime, the overshooting effect is more and more obvious and has a significant influence to gate delay and power consumption. Recently, researchers have already proposed the overshooting effect models for an inverter. However, the accurate overshooting effect model for multiple-input gates is seldom presented and the existing technology to reduce a multipleinput gate to an inverter is not useful when modeling the overshooting effect for multiple-input gates. Therefore, modeling the overshooting effect for multiple-input gates is proposed in this paper. Firstly, a formula-based model is presented for the overshooting time of 2-input NOR gate. Then, more complicated methods are given to calculate the overshooting time of 3-input NOR gate and other multiple-input gates. The proposed model is verified to have a good agreement, within 3.4% error margin, compared with SPICE simulation results using CMOS 32 nm PTM model.
KW - Gate delay
KW - Multiple-input gates
KW - Nanometer technology
KW - Overshooting effect
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U2 - 10.1587/transfun.E97.A.1059
DO - 10.1587/transfun.E97.A.1059
M3 - Article
AN - SCOPUS:84899744327
SN - 0916-8508
VL - E97-A
SP - 1059
EP - 1074
JO - IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences
JF - IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences
IS - 5
ER -