抄録
The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 732-736 |
| ページ数 | 5 |
| ジャーナル | Journal of the Electrochemical Society |
| 巻 | 139 |
| 号 | 3 |
| DOI | |
| 出版ステータス | Published - 1992 3月 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 再生可能エネルギー、持続可能性、環境
- 表面、皮膜および薄膜
- 電気化学
- 材料化学
UN SDG
この成果は、次の持続可能な開発目標に貢献しています
