Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao; H. Oigawa; J. Ji; T. Ueda

doi:10.1109/ICSENS.2011.6127322

Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

M. Zhao^*, H. Oigawa, J. Ji, T. Ueda

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情報生産システム研究センター

研究成果: Conference contribution

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This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

本文言語	English
ホスト出版物のタイトル	Proceedings of IEEE Sensors
ページ	1693-1696
ページ数	4
DOI	https://doi.org/10.1109/ICSENS.2011.6127322
出版ステータス	Published - 2011
イベント	10th IEEE SENSORS Conference 2011, SENSORS 2011 - Limerick 継続期間: 2011 10月 28 → 2011 10月 31

Other

Other	10th IEEE SENSORS Conference 2011, SENSORS 2011
City	Limerick
Period	11/10/28 → 11/10/31

ASJC Scopus subject areas

電子工学および電気工学

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10.1109/ICSENS.2011.6127322

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Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

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