Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Yuya Kajikawa; Suguru Noda; Hiroshi Komiyama

doi:10.1116/1.1619414

Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

Yuya Kajikawa^*, Suguru Noda, Hiroshi Komiyama

^*この研究の対応する著者

研究成果: Article › 査読

104 被引用数 (Scopus)

抄録

The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.

本文言語	English
ページ（範囲）	1943-1954
ページ数	12
ジャーナル	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
巻	21
号	6
DOI	https://doi.org/10.1116/1.1619414
出版ステータス	Published - 2003 11月
外部発表	はい

ASJC Scopus subject areas

凝縮系物理学
表面および界面
表面、皮膜および薄膜

文献へのアクセス

10.1116/1.1619414

他のファイルとリンク

引用スタイル

@article{fe9a3168991d455a960e27e8588e59ce,

title = "Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides",

abstract = "The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.",

author = "Yuya Kajikawa and Suguru Noda and Hiroshi Komiyama",

year = "2003",

month = nov,

doi = "10.1116/1.1619414",

language = "English",

volume = "21",

pages = "1943--1954",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

AU - Kajikawa, Yuya

AU - Noda, Suguru

AU - Komiyama, Hiroshi

PY - 2003/11

Y1 - 2003/11

N2 - The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.

AB - The PO-determining mechanism of reactive-sputter-deposited TiN, AlN, and TaN was studied. Both the existing experimental results for these three materials and the existing models explaining preferred orientation were experimentally studied. The resultant data were analyzed in detail.

UR - http://www.scopus.com/inward/record.url?scp=0842333276&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0842333276&partnerID=8YFLogxK

U2 - 10.1116/1.1619414

DO - 10.1116/1.1619414

M3 - Article

AN - SCOPUS:0842333276

SN - 0734-2101

VL - 21

SP - 1943

EP - 1954

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

IS - 6

ER -

Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides

抄録

ASJC Scopus subject areas

文献へのアクセス

他のファイルとリンク

フィンガープリント

引用スタイル