Depth profile analysis of chemical structures around lubricant/overcoat interface using plasmonic sensor

M. Yanagisawa, M. Kunimoto, T. Homma

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

A chemical depth profile in lubricant films, carbon films, and their interfaces is an informative parameter for hard disk media because molecular features of lubricants bonded to a surface of carbon overcoats (COCs), which usually consist of a nitrogen doped layer, are important to achieve high tribological performance. However, it was difficult to analyze their interfaces with high depth resolution because thickness of lubricant films and COC films are so thin, i.e. 1.5nm and 2nm, respectively. We have developed new method using plasmonic sensors, which has measurement capability for chemical structures with depth resolution of 0.1nm by surface-enhanced Raman spectroscopy (SERS). We examined the lubricant film composed of perfluorinated polyether (PFPE) with phosphazene derivative (A2OH) on a diamond-like carbon (DLC) film. The result shows that the functional group is adsorbed on the DLC surface, where lower shift in the wave number of phenyl group is observed. The depth profile of the intensity ratio of D-peak to G-peak shows the maximum at around the surface of the DLC film. A variety of organic components in the DLC films, fabricated by a chemical vapor deposition (CVD), were observed in it. Besides, the depth profiles shows that organic materials, involving methyl, ethyl, or ethylene groups, Co(OH)x exist in the film.

本文言語English
ホスト出版物のタイトルASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016
出版社American Society of Mechanical Engineers
ISBN(電子版)9780791849880
DOI
出版ステータスPublished - 2016
イベントASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016 - Santa Clara, United States
継続期間: 2016 6月 202016 6月 21

出版物シリーズ

名前ASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016

Other

OtherASME 2016 Conference on Information Storage and Processing Systems, ISPS 2016
国/地域United States
CitySanta Clara
Period16/6/2016/6/21

ASJC Scopus subject areas

  • 制御およびシステム工学
  • ハードウェアとアーキテクチャ
  • 情報システム

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