Development of numerical model for reactions in fluidized bed grid zone-application to chemical vapor deposition of polycrystalline silicon by monosilane pyrolysis-

T. Kojima*, T. Kimura, M. Matsukata

*この研究の対応する著者

研究成果: Article査読

13 被引用数 (Scopus)

抄録

A simulation model for behavior of gas and solid in fluidized bed grid zone was developed and its validity was tested by comparison of its numerical results with the experimental cold model data of particle velocity and temperature relaxation in jet to guarantee the validity of the model. The proposed model was applied to chemical vapor deposition of polycrystalline silicon by monosilane pyrolysis, taking into account of both homogeneous decomposition to fine powder and heterogeneous chemical vapor deposition on the surface of silicon particles. A computational approach considering the local rate of thermal decomposition of monosilane in a grid zone was carried out to simulate the level of monosilane conversion. The numerical results on fines formation in the jet were much smaller than the previously reported experimental results on the fine elutriation from fluidized beds. The fines formation was confirmed to occur mainly in bubbles. To discuss clogging phenomena quantitatively, the relative rates of deposition and fine formation were defined as the ratios of the total deposition rate and fines formation rate to the circulation rate of solid in the annulus. The numerical well explained the experimentally observed effects of gas velocity, temperature, silane concentration and grid structure on the possibility of clogging.

本文言語English
ページ(範囲)2527-2534
ページ数8
ジャーナルChemical Engineering Science
45
8
DOI
出版ステータスPublished - 1990
外部発表はい

ASJC Scopus subject areas

  • 化学一般
  • 化学工学一般
  • 産業および生産工学

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