TY - JOUR
T1 - Dielectric properties of plasma-polymerized tetrafluoroethylene films
AU - Nakano, Toshiki
AU - Fukuyama, Masao
AU - Ohki, Yoshimichi
PY - 1988/6
Y1 - 1988/6
N2 - A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.
AB - A plasma-polymerized tetrafluoroethylene film has dielectric loss peaks below -50degC and approximately at 40degC. The effects of the substrate temperature during polymerization and of plasma irradiation after polymerization on the appearance of the peaks were studied. The low-temperature peak seems to be due to local-mode relaxation of polar groups, while the high-temperature peak seems to be due to phase transition.
KW - Dielectric properties
KW - Local mode relaxation
KW - Organic thin film
KW - Phase transition
KW - Plasma polymerization
UR - http://www.scopus.com/inward/record.url?scp=0024018362&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0024018362&partnerID=8YFLogxK
U2 - 10.1143/JJAP.27.1042
DO - 10.1143/JJAP.27.1042
M3 - Article
AN - SCOPUS:0024018362
SN - 0021-4922
VL - 27
SP - 1042
EP - 1046
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 6R
ER -