TY - JOUR
T1 - DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION.
AU - Atoda, N.
AU - Kawakatsu, H.
AU - Tanino, H.
AU - Ichimura, S.
AU - Hirata, M.
AU - Hoh, K.
PY - 1983/1/1
Y1 - 1983/1/1
N2 - With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.
AB - With synchrotron radiation from the storage ring ETL-TERAS, the influence of Fresnel diffraction on replicated patterns was investigated. Spatial intensity distributions due to the diffraction were calculated with Fresnel integrals and compared with replicated patterns. Pattern degradation due to the diffraction depends on a parameter U//0 equals W/(G//p lambda /2)** one-half , where W is the pattern width, G//p the mask-to-wafer distance, and lambda the wavelength. From the calculation and the experiments it is concluded that the value of U//0 is needed to be larger than about three for a satisfactory pattern replication. Work with an experimental stencil mask with patterns of submicron dimensions is also described briefly.
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U2 - 10.1116/1.582766
DO - 10.1116/1.582766
M3 - Conference article
AN - SCOPUS:0020833541
SN - 0734-211X
VL - 1
SP - 1267
EP - 1270
JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
IS - 4
T2 - Proc of the Int Symp on Electron, Ion, and Photon Beams
Y2 - 31 May 1983 through 3 June 1983
ER -