Direct engraving of mask patterns in a resist film was tried by exposing with synchrotron radiation. Using a stencil mask made of a Si//3N//4 substrate, submicron structures could be successfully replicated. Fundamental aspects of resist decomposition by synchrotron radiation were also investigated by mass and electron spectroscopy.
|Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
|Published - 1983
|Proc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA
継続期間: 1983 5月 31 → 1983 6月 3
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