TY - JOUR
T1 - Effects of chemical treatment of indium tin oxide electrode on its surface roughness and work function
AU - Khan, Md Zaved Hossain
AU - Nakanishi, Takuya
AU - Osaka, Tetsuya
N1 - Funding Information:
This work was financially supported in part by Grant-in-Aid for Specially Promoted Research “Establishment of Electrochemical Device Engineering” and Global COE program “Practical Chemical Wisdom”, from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan .
PY - 2014/4/15
Y1 - 2014/4/15
N2 - In this paper, we report the effects of chemical treatment of indium tin oxide (ITO) surface on its surface chemistry such as chemical composition and surface roughness and on its usage as an electrode with monolayer modification. Atomic force microscopy, angel-resolved X-ray photoelectron spectroscopy, and Kelvin probe force microscopy have been used to investigate the morphology and the chemical properties of commercial thin ITO films after several treatments commonly used prior to the formation of organic layer on the surface. The amount of spike present on the surface of as-received ITO substrates was significantly reduced by etching with KOH whereas the roughness of ITO increased with HCl etching. We demonstrated that the successive treatment of ITO electrode with HCl and KOH affects the surface characteristics such as roughness and work function, contributing to the potentiometric detection of tryptophan.
AB - In this paper, we report the effects of chemical treatment of indium tin oxide (ITO) surface on its surface chemistry such as chemical composition and surface roughness and on its usage as an electrode with monolayer modification. Atomic force microscopy, angel-resolved X-ray photoelectron spectroscopy, and Kelvin probe force microscopy have been used to investigate the morphology and the chemical properties of commercial thin ITO films after several treatments commonly used prior to the formation of organic layer on the surface. The amount of spike present on the surface of as-received ITO substrates was significantly reduced by etching with KOH whereas the roughness of ITO increased with HCl etching. We demonstrated that the successive treatment of ITO electrode with HCl and KOH affects the surface characteristics such as roughness and work function, contributing to the potentiometric detection of tryptophan.
KW - Atomic force microscopy
KW - Indium tin oxide
KW - Kelvin probe force microscopy
KW - Surface roughness
KW - Surface treatment
KW - Surface work function
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U2 - 10.1016/j.surfcoat.2014.02.017
DO - 10.1016/j.surfcoat.2014.02.017
M3 - Article
AN - SCOPUS:84900383232
SN - 0257-8972
VL - 244
SP - 189
EP - 193
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
ER -