Electronic breakdown process of plasma polymer films

T. Nakano*, M. Fukuyama, H. Hayashi, K. Ishii, Y. Ohki

*この研究の対応する著者

研究成果: Paper査読

抄録

It has been suggested that when dielectric breakdown is caused by an electronic process, the scattering of electrons will increase the dielectric strength. To confirm this, polar groups were introduced into plasma-polymer films, assuming that the polar groups would act as scattering centers, and the dielectric strength was measured. It was found that when the breakdown process is electronic, the breakdown field increases due to the introduction of an appropriate number of electron scattering centers such as nitrogen and fluorine.

本文言語English
ページ82-86
ページ数5
出版ステータスPublished - 1989
イベントProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics - Trondheim, Norway
継続期間: 1989 7月 31989 7月 6

Other

OtherProceedings of the 3rd International Conference on Conduction and Breakdown in Solid Dielectrics
CityTrondheim, Norway
Period89/7/389/7/6

ASJC Scopus subject areas

  • 工学(全般)

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