Electronic structure of silicon-oxygen high polymers

Kyozaburo Takeda*, Kenji Shiraishi

*この研究の対応する著者

研究成果: Article査読

20 被引用数 (Scopus)

抄録

The electronic structure of silicon-oxygen high polymers (siloxane and siloxene) have been calculated by the first-principle local-density-functional method. Oxygen's lone-pair (OLP) states play an important role in the electronic structure of these polymers, in accordance with oxygen's spatial position. In siloxane, where oxygen atoms position in the Si skeleton backbone, non-bonding (n) electrons in the OLP states cut Si's σ-electron delocalization, and widen the band gap. On the contrary, when oxygen atoms are located outside of the Si skeleton (siloxene), the characteristic σ-n mixing occuring at the band-edge states has a potential to reduce the band gap.

本文言語English
ページ(範囲)301-305
ページ数5
ジャーナルSolid State Communications
85
4
DOI
出版ステータスPublished - 1993 1月
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 材料化学

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