TY - JOUR
T1 - Evaluation of optimum sheath electric field and minimum catalyst interval for selective production of metallic carbon nanotubes
AU - Matsunaga, Yasushi
AU - Hatori, Tadatsugu
AU - Kato, Tomokazu
PY - 2006/3/8
Y1 - 2006/3/8
N2 - We estimate the optimum electric field at the sheath edge and the minimum interval among nanotubes to promote the growth of armchair-type nanotubes (metallic character) as a function of the nanotube length. On the basis of the electric charge distribution in a nanotube and the optimum electric field E 1* at the tip of a nanotube evaluated using the Hückel-Poisson method, we calculate the structure of the electric field lines outside a nanotube in the sheath region. As the nanotube length increases, E1* decreases. To maintain the chemical activity at the tip, the sheath electric field must be decreased. We show the decreasing rate of the sheath electric field with respect to the nanotube length.
AB - We estimate the optimum electric field at the sheath edge and the minimum interval among nanotubes to promote the growth of armchair-type nanotubes (metallic character) as a function of the nanotube length. On the basis of the electric charge distribution in a nanotube and the optimum electric field E 1* at the tip of a nanotube evaluated using the Hückel-Poisson method, we calculate the structure of the electric field lines outside a nanotube in the sheath region. As the nanotube length increases, E1* decreases. To maintain the chemical activity at the tip, the sheath electric field must be decreased. We show the decreasing rate of the sheath electric field with respect to the nanotube length.
KW - Armchair type
KW - Carbon nanotube
KW - Frontier electron density
KW - Hückel-Poisson method
KW - Metallic carbon nanotube
KW - Selective production of metallic nanotubes
KW - Sheath electric field
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U2 - 10.1143/JJAP.45.1877
DO - 10.1143/JJAP.45.1877
M3 - Review article
AN - SCOPUS:33644904632
SN - 0021-4922
VL - 45
SP - 1877
EP - 1879
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 3 A
ER -