A double tubed coaxial line type microwave plasma CVD system has been developed for a-Si:H film deposition using hydrogen and argon gases with pure SiH//4 gas as the material gas. The film quality was evaluated as a function of the plasma condition. A high-quality film can be fabricated under hydrogen plasma because a large amount of hydrogen radicals covers the film surface, thereby causing a thermal structural relaxation of silane radicals. This relaxation results when the silane radicals increase their surface mobility after the soft landing on the film surface.
|ジャーナル||Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi)|
|出版ステータス||Published - 1987 11月|
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