TY - JOUR
T1 - Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance
AU - Yuasa, Motokazu
AU - Kawarada, Hiroshi
AU - Wei, Jin
AU - Ma, Jing Sheng
AU - Suzuki, Jun ichi
AU - Okada, Sigenobu
AU - Hiraki, Akio
N1 - Funding Information:
The authors wish to thank Associate Professor H. Mon and the staff members at the Ultra-High-Voltage TEM Center, Osaka University. This work was supported in part by a Grant-in-Aid for Developmental Scientific Research (63850008) from the Ministry of Education and Culture of Japan.
PY - 1991/12/10
Y1 - 1991/12/10
N2 - Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.
AB - Helium gas has been employed instead of hydrogen as the carrier gas to fabricate diamond films using a magneto-active plasma chemical vapour deposition (CVD) system at low pressures. Helium plasma has a much higher plasma density than hydrogen plasma and it has been shown that this promotes fabrication of good quality diamond films at low pressures. Using a gas mixture of methyl alcohol and helium, microcrystalline diamond films with a grain size smaller than 500 Å have been fabricated. These microsized diamond films have been investigated by employing X-ray photoelectron spectroscopy, and features equivalent to those of natural diamond have been obtained.
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U2 - 10.1016/0257-8972(91)90086-C
DO - 10.1016/0257-8972(91)90086-C
M3 - Article
AN - SCOPUS:0026372491
SN - 0257-8972
VL - 49
SP - 374
EP - 380
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - 1-3
ER -