TY - GEN
T1 - Fabrication of Sputtered Low-strain, Low-loss SiN Waveguide for Optical Phased Array Device
AU - Nishimura, Masaki
AU - Takemura, Hayato
AU - Umezawa, Toshimasa
AU - Yamwong, Wittawat
AU - Kawanishi, Tetsuya
AU - Yamamoto, Naokatsu
AU - Klunngien, Nipapan
N1 - Funding Information:
ACKNOWLEDGMENT This study was conducted as part of a research project supported by the Japanese Government funding for the “R&D to Expand Radio Frequency Resources” by the Ministry of Internal Affairs and Communications. We thank all the technical staff in the photonic device laboratory at NICT.
Publisher Copyright:
© 2020 IEEE.
PY - 2020/10/4
Y1 - 2020/10/4
N2 - We fabricated sputtered SiN-waveguides with film stress-free, low-loss waveguide at room temperature for optical phased array devices. The beam steering performance was also estimated using the sputtered thick SiN waveguide.
AB - We fabricated sputtered SiN-waveguides with film stress-free, low-loss waveguide at room temperature for optical phased array devices. The beam steering performance was also estimated using the sputtered thick SiN waveguide.
KW - SiN
KW - optical phased array
KW - sputtering
KW - stress-free
UR - http://www.scopus.com/inward/record.url?scp=85098724872&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85098724872&partnerID=8YFLogxK
U2 - 10.1109/OECC48412.2020.9273608
DO - 10.1109/OECC48412.2020.9273608
M3 - Conference contribution
AN - SCOPUS:85098724872
T3 - 25th Opto-Electronics and Communications Conference, OECC 2020
BT - 25th Opto-Electronics and Communications Conference, OECC 2020
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 25th Opto-Electronics and Communications Conference, OECC 2020
Y2 - 4 October 2020 through 8 October 2020
ER -